Work

Study of Plug Etch back process matching on faraday shielded ICP and traditional CCP plasma ETCH chambers

Year: 2018

Type: conference-paper

Source: China Semiconductor Technology International Conference (CSTIC)

DOI: 10.1109/cstic.2018.8369227

Authors: Yali Fu, Shawming Ma, Yi Wang, Jammy Xiao, M H Kim, Nancy Zhang, Mingjie Jiao, Frank Wang, Tammy Lee

Institution: Peking University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2805384186

FWCI: 0.399

Cites: 4

Cited by: 1

Related to: 10