Work

Atomistic Tight-Binding Study of Contact Resistivity in Si/SiGe PMOS Schottky Contacts

Year: 2018

Type: article

Source: IEEE Transactions on Nanotechnology

DOI: 10.1109/tnano.2018.2840836

Authors: Prasad Sarangapani, Cory Weber, Jiwon Chang, Stephen Cea, Michael Povolotskyi, Gerhard Klimeck, Tillmann Kubis

Institutions: Purdue University West Lafayette, Intel (United States)

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Semiconductor Research Corporation

OpenAlex ID: W2805676179

FWCI: 0.54

Cites: 27

Cited by: 10

Related to: 10