Work

Use of Anthropometry and Fit Databases to Improve the Bottom-Line

Year: 2018

Type: conference-paper

Source: Advances in intelligent systems and computing

DOI: 10.1007/978-3-319-96065-4_49

Authors: Kathleen M. Robinette, Daisy Veitch

Language: English

Topic: Fashion and Cultural Textiles

Subfield: Museology

Field: Arts and Humanities

Domain: Social Sciences

Open Access status: closed

OpenAlex ID: W2886418707

FWCI: 2.092

Cites: 5

Cited by: 2

Related to: 10