Work

A Review of Metalorganic Chemical Vapor Deposition of High-Temperature Superconducting Thin Films

Year: 1990

Type: conference-paper

Abstract: A status report is given on the metalorganic chemical vapor deposition (MOCVD) of high-temperature superconducting thin films. The advantages of MOCVD processing manifest themselves in the quality of the films produced, and in the economy of the process. Metalorganic precursor requirements, deposition parameters and film properties are discussed. Also difficulties have been identified in making MOCVD a manufacturing technology. To solve these problems, future research directions are proposed.

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.965153

Authors: A. Erbil, K. Zhang, B. S. Kwak, E. P. Boyd

Institution: Georgia Institute of Technology

Language: English

Topic: Superconducting Materials and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funder: U.S. Department of Energy

OpenAlex ID: W2017762799