Work

Effective Atmospheric-Pressure Plasma Treatment toward High-Performance Solution-Processed Oxide Thin-Film Transistors

Year: 2018

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.8b11111

Authors: Jintaek Park, Jae-Eun Huh, Sung-Eun Lee, Junhee Lee, Won Hyung Lee, Keon-Hee Lim, Youn Sang Kim

Institutions: Seoul National University, Samsung Display (South Korea), University of Illinois Urbana-Champaign, Advanced Institute of Convergence Technology

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Research Foundation of Korea

Awards: G3290600800, G6153186815

OpenAlex ID: W2887432621

FWCI: 2.584

Cites: 28

Cited by: 48

Related to: 10