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Close to you? Bias and precision in patent-based measures of technological proximity

Year: 2008

Type: article

Source: Research Policy

DOI: 10.1016/j.respol.2008.05.011

Authors: Mary Benner, Joel Waldfogel

Language: English

Topic: Intellectual Property and Patents

Subfield: Management of Technology and Innovation

Field: Business, Management and Accounting

Domain: Social Sciences

Open Access status: closed

OpenAlex ID: W2890958129

FWCI: 7.983

Cites: 23

Cited by: 186

Related to: 10