Work

Stochastic printing failures in extreme ultraviolet lithography

Year: 2018

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.17.4.041011

Author: Peter De Bisschop

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2892656911

FWCI: 3.63

Cites: 36

Cited by: 77

Related to: 10