Fabrication of sub-20 nm patterns using dopamine chemistry in self-aligned double patterning
Year: 2018
Type: article
Source: Nanoscale
DOI: 10.1039/c8nr04040k
Institution: University of Massachusetts Amherst
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2896346909
