Work

Stability and microbial toxicity of HfO2 and ZrO2 nanoparticles for photolithography

Year: 2018

Type: article

Source: Green Materials

DOI: 10.1680/jgrma.18.00056

Authors: Jorge Gonzalez-Estrella, Jim A Field, Christopher K Ober, Reyes Sierra-Alvarez

Institutions: University of New Mexico, University of Arizona, Cornell University

Language: English

Topic: Nanoparticles: synthesis and applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2900768794

FWCI:

Cites: 41

Cited by: 5

Related to: 10