Work

On the formation of ultrathin SIMOX structures by low energy implantation

Year: 1993

Type: article

Authors: F. Namavar, B. Buchanan, Nader M. Kalkhoran

Institution: Spire Corporation (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2908183603

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