Work

Residual stress in SiO2 thin films on silicon

Year: 2016

Type: article

Authors: Oili Ylivaara, Matti Putkonen, Kristin Pfeiffer, Adriana Szeghalmi, Riikka L. Puurunen

Institution: Friedrich Schiller University Jena

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2918215069

FWCI: 0.225

Cites:

Cited by: 1

Related to: 10