Chemo‐mechanical polish lithography: A pathway to low loss large‐scale photonic integration on lithium niobate on insulator

Year: 2019

Type: article

Abstract: We discuss the recent breakthrough in the field of photonic integrated circuits for generating high-quality photonic structures on lithium niobate (LN) on insulator (LNOI). This is enabled by the development of chemo-mechanical polish lithography (CMPL). We begin with a brief introduction of the background, followed by the description of the CMPL technique that holds the promise for realizing LNOI waveguides of ultralow propagation loss approaching the absorption limit of LN. We demonstrate fabrication of low loss optical waveguides with the CMPL and construction of beamsplitters with the fabricated LNOI waveguides. At last, some conclusions and future perspectives will be given. A video abstract of this article can be found at: https://youtu.be/sgnecU_QzcY

Source: Quantum Engineering

DOI: 10.1002/que2.9

Authors: Min Wang, Rongbo Wu, Jintian Lin, Jianhao Zhang, Zhiwei Fang, Zhifang Chai, Ya Cheng

Institutions: East China Normal University, Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, University of Chinese Academy of Sciences, State Key Laboratory of High Field Laser Physics, Shanxi University

Language: English

Topic: Photorefractive and Nonlinear Optics

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: bronze

Funders: National Natural Science Foundation of China, Chinese Academy of Sciences, Science and Technology Commission of Shanghai Municipality, Shanghai Municipal Human Resources and Social Security Bureau, Shanghai Rising-Star Program, National Key Research and Development Program of China, Youth Innovation Promotion Association

OpenAlex ID: W2921900175