Year: 2010
Type: conference-paper
Abstract: We have demonstrated a thick electrodeposition process for NiFe 80/20 (Permalloy80) that can achieve a permeability of 8500 as measured by VSM and in situ measurements.The key features of our electroplating process that have enabled us to obtain this permeability are: electroplating in an inert N 2 atmosphere, separating the anode from the cathode by means of a porous plastic frit, and agitating the wafer with an array of parallel fins less than 500 µm from the wafer surface.This electrodeposition method could be used to produce a wide variety of magnetic MEMS sensors and actuators that consume far less power.
Authors: M. Glickman, T. Niblock, J. Harrison, I.B. Goldberg, P. Tseng, J.W. Judy
Institutions: University of California, Los Angeles, Magzor (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W2927100894