Work

An Anisotropic-wet-etched Pitch or Roll Mode-matched Gyroscope With Slanted Quadrature-cancellation Electrodes

Year: 2016

Type: conference-paper

Abstract: This paper presents the design, fabrication, and preliminary characterization of a novel anisotropic-wet-etched silicon pitch or roll gyroscope fabricated on a silicon-on-insulator (SOI) wafer without using the deep reactive ion etching (DRIE) process.The novel gyroscope features slanted electrodes with sub-micron gaps, which for the first time, enables electrostatic quadrature tuning in out-of-plane gyroscopes.Complete quadrature cancellation and perfect mode-matching of the drive and sense modes at 200 kHz are demonstrated in fabricated devices.Sensitivity characterization measures a scale factor of 35.4 pA/°/s under quadrature-cancelled mode-matched condition, showing ~10× improvement in scale factor compared to operation without quadrature compensation.

Source: Solid-State Sensors, Actuators, and Microsystems Workshop (Hilton Head Workshop)

DOI: 10.31438/trf.hh2016.61

Authors: H. Wen, S. Wisher, F. Ayazi

Institution: Georgia Institute of Technology

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

Funder: Defense Advanced Research Projects Agency

Award: G1635955495