Work

Evolution of photoresist layer structure and surface morphology under fluorocarbon‐based plasma exposure

Year: 2019

Type: article

Source: Plasma Processes and Polymers

DOI: 10.1002/ppap.201900026

Authors: Adam Pranda, Sandra A. Gutierrez Razo, John T. Fourkas, Gottlieb S. Oehrlein

Institution: University of Maryland, College Park

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Division of Civil, Mechanical and Manufacturing Innovation, Fusion Energy Sciences

Awards: SNM: Three-Color Photolithography for Scalable, Large-Area, Low-Cost Nanomanufacturing, G1925386490, G3299177405

OpenAlex ID: W2933527860

FWCI: 0.36

Cites: 42

Cited by: 6

Related to: 10