Work

Auto-Masked Surface Texturing of Kerf-Loss Free Silicon Wafers Using Hexafluoroisopropanol in a Capacitively Coupled Plasma Etching System

Year: 2019

Type: article

Source: ECS Journal of Solid State Science and Technology

DOI: 10.1149/2.0091904jss

Authors: Suhyun Kim, Jin-Su Park, Jun-Hyun Kim, Chang-Koo Kim, Jihyun Kim

Institutions: Korea University, Ajou University

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Research Foundation of Korea, Korea Institute of Energy Technology Evaluation and Planning

Awards: G1069175275, G268074509, G4902162394

OpenAlex ID: W2946617941

FWCI: 0.271

Cites: 15

Cited by: 4

Related to: 10