Work

ChemInform Abstract: REPEATED REMOVAL OF THIN LAYERS OF SILICON BY ANODIC OXIDATION

Year: 1976

Type: article

Source: ChemInform

DOI: 10.1002/chin.197652013

Authors: H. D. BARBER, H. B. LO, J. E. JONES

Language: German

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2950799382

FWCI:

Cites: 1

Cited by:

Related to: 10