Work

ChemInform Abstract: BORON DIFFUSION IN SILICON‐CONCENTRATION AND ORIENTATION DEPENDENCE, BACKGROUND EFFECTS, AND PROFILE ESTIMATION

Year: 1975

Type: article

Source: ChemInform

DOI: 10.1002/chin.197535015

Author: RICHARD B. FAIR

Language: German

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2952060080

FWCI:

Cites: 1

Cited by:

Related to: 10