Nonlinear diffusion, boundary layers and nonsmoothness: Analysis of challenges in drift–diffusion semiconductor simulations
Work
Year: 2019
Type: article
Authors Patricio Farrell, Dirk Peschka
Institutions Universität Hamburg, Hamburg University of Technology, Weierstrass Institute for Applied Analysis and Stochastics
Cites: 49
Cited by: 9
Related to: 10
FWCI: 0.365
Citation percentile (by year/subfield): 69.15
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Sustainable Development Goal Peace, justice, and strong institutions
Open Access status: bronze
Funder Einstein Stiftung Berlin