Work

ChemInform Abstract: PHOTO‐CVD FOR VLSI ISOLATION

Year: 1985

Type: article

Source: ChemInform

DOI: 10.1002/chin.198501364

Authors: J. Y. CHEN, R. C. HENDERSON, J. T. HALL, J. W. PETERS

Language: German

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2953120327

FWCI: 0.541

Cites: 1

Cited by: 1

Related to: 10