Work

ALD HfO2 Films for Defining Microelectrodes for Electrochemical Sensing and Other Applications

Year: 2019

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.9b06891

Authors: Charmaine Chia, Max M. Shulaker, J Provine, Stefanie S. Jeffrey, Roger T. Howe

Institutions: Stanford University, Massachusetts Institute of Technology, Stanford Medicine

Language: English

Topic: Electrochemical Analysis and Applications

Subfield: Electrochemistry

Field: Chemistry

Domain: Physical Sciences

Open Access status: closed

Funder: Defense Advanced Research Projects Agency

Award: G8493295444

OpenAlex ID: W2954598596

FWCI: 0.657

Cites: 61

Cited by: 9

Related to: 10