Work

Investigation of Tungsten Rich Residue Defects Induced by Electron Beam Inspection post Contact Tungsten Chemical and Mechanical Polish

Year: 2019

Type: conference-paper

Source: China Semiconductor Technology International Conference (CSTIC)

DOI: 10.1109/cstic.2019.8755745

Authors: Rongwei Fan, Hunglin Chen, Kai Wang, Yin Long, Qiliang Ni, Xiaofang Gu

Institution: Shanghai Huali Microelectronics (China)

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2955272995

FWCI:

Cites: 4

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Related to: 10