Work

Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists

Year: 2019

Type: article

Abstract: Novel positive-tone hybrid resists developed by vapor-phase inorganic infiltration feature fully tunable resist performance parameters and high-aspect-ratio pattern transfer capability.

Source: Journal of Materials Chemistry C

DOI: 10.1039/c9tc02974e

Authors: Nikhil Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Jiyoung Kim, Aaron Stein, Chang-Yong Nam

Institutions: Brookhaven National Laboratory, Center for Functional Nanomaterials, Stony Brook University, The University of Texas at Dallas

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funders: U.S. Department of Energy, Office of Science, Basic Energy Sciences, Brookhaven National Laboratory

Awards: G1285306620, G1847291448, G241279073, G3262563802, G357145406, G5765906131, G6965541988, G7463374569

OpenAlex ID: W2960993351

FWCI: 2.077

Cites: 86

Cited by: 78

Related to: 10