Work

Self-aligned structures by a single-step through-membrane 100-keV electron beam lithography

Year: 2019

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/1.5114948

Authors: Sergey Gorelick, Alex de Marco

Institutions: ARC Centre of Excellence in Advanced Molecular Imaging, Monash University, University of Warwick

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2968071160

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Cites: 12

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Related to: 10