Work

Selective Etching of Native Silicon Oxide in Preference to Silicon Oxide and Silicon

Year: 2019

Type: conference-paper

Source: International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)

DOI: 10.1109/vlsi-tsa.2019.8804691

Authors: Christopher Ahles, Jong Choi, Raymond Hung, Namsung Kim, Srinivas Nemani, Andrew Kummel

Institution: Applied Materials (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2969578131

FWCI:

Cites: 3

Cited by: 2

Related to: 10