Temperature-induced nanostructural evolution of hydrogen-rich voids in amorphous silicon: a first-principles study
Year: 2019
Type: article
Abstract: The paper presents an ab initio study of temperature-induced nanostructural evolution of hydrogen-rich voids in amorphous silicon. By using large a-Si models, obtained from classical molecular-dynamics simulations, with a realistic void-volume density of 0.2%, the dynamics of Si and H atoms on the surface of the nanometer-size cavities were studied and their effects on the shape and size of the voids were examined using first-principles density-functional simulations. The results from ab initio calculations were compared with those obtained from using the modified Stillinger-Weber potential. The temperature-induced nanostructural evolution of the voids was examined by analyzing the three-dimensional distribution of Si and H atoms on/near void surfaces using the convex-hull approximation, and computing the radius of gyration of the corresponding convex hulls. A comparison of the results with those from the simulated values of the intensity in small-angle X-ray scattering of a-Si/a-Si:H in the Guinier approximation is also provided, along with a discussion on the dynamics of bonded and non-bonded hydrogen in the vicinity of voids.
Source: Nanoscale
DOI: 10.1039/c9nr08209c
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
Awards: G2766040076, Collaborative Research: Joint utilization of experimental and theoretical information: a new paradigm for modeling complex materials, Collaborative Research : Joint utilization of experimental and theoretical information: a new paradigm for modeling complex materials, G7816486003
OpenAlex ID: W2986318956
