Work

Porphyrin-Based Photocatalytic Lithography

Year: 2007

Type: article

Abstract: Photocatalytic lithography is an emerging technique that couples light with coated mask materials in order to pattern surface chemistry. We excite porphyrins to create radical species that photocatalytically oxidize, and thereby pattern, chemistries in the local vicinity. The technique advantageously does not necessitate mass transport or specified substrates, it is fast and robust and the wavelength of light does not limit the resolution of patterned features. We have patterned proteins and cells in order to demonstrate the utility of photocatalytic lithography in life science applications.

Source: OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)

Authors: Jane P. Bearinger, G. Stone, Allen T. Christian, Lawrence Dugan, Amy L. Hiddessen, Kunlan Wu, Li‐Ming Wu, Julie Hamilton, Cheryl Stockton, Jeffrey A. Hubbell

Institutions: Lawrence Livermore National Laboratory, École Polytechnique Fédérale de Lausanne

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W2988284980

FWCI:

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