Investigation of sub 50 nm patterned polymer brushes for lithographic applications
Year: 2004
Type: article
Source: APS
Authors: Erik W. Edwards, Young-Hye Na, Tushar Jain, Juan Pablo, Paul F. Nealey
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W3000312765