Work

Selective electrochemical etching of epitaxial aluminum nitride thin film

Year: 2020

Type: article

Source: Applied Surface Science

DOI: 10.1016/j.apsusc.2020.145279

Authors: Yongha Choi, Rakjun Choi, Jihyun Kim

Institution: Korea University

Language: English

Topic: GaN-based semiconductor devices and materials

Subfield: Condensed Matter Physics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funders: National Research Foundation of Korea, Korea Institute of Energy Technology Evaluation and Planning

Awards: G268074509, G4508406792, G4835193245, G4902162394, G6181278601, G7406285257

OpenAlex ID: W3000610690

FWCI: 1.092

Cites: 28

Cited by: 16

Related to: 10