Work

Contact Engineering of Layered MoS 2 via Chemically Dipping Treatments

Year: 2020

Type: article

Source: Advanced Functional Materials

DOI: 10.1002/adfm.202000250

Authors: Seungho Bang, Sangyeob Lee, Amritesh Rai, Ngoc Thanh Duong, Iljo Kawk, Steven Wolf, Choong‐Heui Chung, Sanjay K. Banerjee, Andrew C. Kummel, Mun Seok Jeong, Jun Hong Park

Institutions: Institute for Basic Science, Sungkyunkwan University, Hanbat National University, The University of Texas at Austin, University of California San Diego, Gyeongsang National University

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, National Research Foundation of Korea, Microelectronics Advanced Research Corporation, Defense Advanced Research Projects Agency

Awards: Electron Spin Effects in Semiconductor Nanostructures, Monolayer Nucleation and Passivation of Advanced Electronic Materials, EFRI 2-DARE: Monolayer Heterostructures: Epitaxy to Beyond-CMOS Devices

OpenAlex ID: W3007204908

FWCI: 1.212

Cites: 69

Cited by: 29

Related to: 10