Work

Plasma sheath material induced dependence due to secondary electron emission

Year: 2020

Type: article

Abstract: Plasma sheaths in front of six different material samples (BN, BNSiO2, Al2O3, SiO2, stainless steel, and silicon) used in various experiments and devices (Hall thrusters, plasma discharge, and microelectronics) are studied using the laser induced fluorescence diagnostic. The specific secondary electron emission (SEE) yield of each material is expected to induce differences in the sheath structure from one sample to another. The experiments are carried out in two different plasma discharges (multipolar device and ECR device), exhibiting distinct electron distribution functions: bi-Maxwellian and Maxwellian. The agreement between the two experiments is good and allows us to classify the materials in a consistent way regarding their SEE yields. The multipolar experiment results are compared to a 1D kinetic sheath model and a 1D-1 V kinetic sheath simulation code. The predictions of the model are discussed and are in good agreement with previous theory. The influence of the low energy impinging electrons on the SEE yield and emissive sheaths is investigated with the code.

Source: Physics of Plasmas

DOI: 10.1063/1.5141348

Authors: V. Pigeon, N. Claire, C. Arnas, K. Terasaka, S. Inagaki

Institutions: Centre National de la Recherche Scientifique, Aix-Marseille Université, Physique des interactions ioniques et moléculaires, Kyushu University, Research Institute for Applied Mechanics, Kyushu University

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funders: Japan Society for the Promotion of Science, National Institute for Fusion Science

Awards: G3559826072, G5392021226