Work

Behavior of Microphase Separation in a Poly(urethane-urea) Film under Deformation

Year: 1998

Type: article

Source: APS

Authors: Benjamin S. Hsiao, Fengji Yeh, Benjamin Chu, Bryan B. Sauer

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3021375590

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