Work

Modeling of Aluminum Etching in a Commercial High Density Plasma Reactor Using BCl_3/Cl_2/Ar Gas Mixtures

Year: 1998

Type: article

Source: APS

Authors: Sejong Choi, P Shing Ho, A. Ting, Ellen Meeks

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3022359272

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Related to: 10