Work

Structural and micromechanical characteristics of low-dielectric organosilicate thin films modified by NH₃ plasma treatment

Year: 2001

Type: article

Authors: 차국헌, 주상현, 김수한, 이진규, 심현상, 김용태, 한진희, 윤도영

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3031674319

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