Work

Stain Effects on Interdiffusion in InAs_ P_x/InP Heterostructures

Year: 1996

Type: article

Source: Japanese Journal of Applied Physics

Authors: Justin T. Douglas, Hirofumi Matsuhata, R. Shioda, H. Ōyanagi, H. Kamei

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3041473299

FWCI:

Cites:

Cited by:

Related to: 10