Work

Tunable Dielectric and Thermal Properties of Oxide Dielectrics via Substrate Biasing in Plasma-Enhanced Atomic Layer Deposition

Year: 2020

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.0c11086

Authors: Yoonjin Kim, Heungdong Kwon, Hyun Soo Han, Hyo Jin K. Kim, Brian S. Y. Kim, Byung Chul Lee, Joohyun Lee, Mehdi Asheghi, Fritz B. Prinz, Kenneth E. Goodson, Jongwoo Lim, Uk Sim, Woosung Park

Institutions: Sookmyung Women's University, Stanford University, Columbia University, Korea Institute of Science and Technology, Korea Research Institute of Standards and Science, Seoul National University, Chonnam National University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Research Foundation of Korea

Awards: G1354209379, G7905966037

OpenAlex ID: W3086994066

FWCI: 0.591

Cites: 51

Cited by: 16

Related to: 10