Work

Tungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizers

Year: 2020

Type: article

Source: Applied Surface Science

DOI: 10.1016/j.apsusc.2020.147862

Authors: Maneesh Kumar Poddar, Palwasha Jalalzai, Samrina Sahir, Nagendra Prasad Yerriboina, Tae-Gon Kim, Jin-Goo Park

Institutions: National Institute of Technology Karnataka, Hanyang University

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3087110251

FWCI: 1.181

Cites: 19

Cited by: 32

Related to: 10