Work

Measurements of spatial distributions of electron density and temperature of 450 MHz UHF plasma using laser Thomson scattering

Year: 2020

Type: article

Abstract: A capacitively coupled Ar plasma was produced by the ultra-high frequency power source (450 MHz) and the plasma parameters were studied by laser Thomson scattering. It was found that a very high density plasma with a low electron temperature was realized; the electron density n e is around (1.1–1.5) × 10 18 m −3 and the electron temperature T e is around (1.7–2.1) eV. Radial profiles of n e and T e were obtained for different pressures and powers. In all the conditions explored, n e had a single-center-peak profile, while T e profiles were relatively flat along the electrode.

Source: Japanese Journal of Applied Physics

DOI: 10.35848/1347-4065/abbb6b

Authors: Yiming Pan, Kentaro Tomita, Yoshinobu Kawai, Masaaki Matsukuma, Kiichiro Uchino

Institutions: Kyushu University, Tokyo Electron Technology Solutions Limited (Japan)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

Funder: Japan Society for the Promotion of Science

Awards: High-power laser experiment of magnetized collisionless shocks, Understanding of anomalous transport in Hall thrusters