Work

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

Year: 2020

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.35848/1347-4065/abc78d

Authors: Moataz Eissa, Takuya Mitarai, Tomohiro Amemiya, Yasuyuki Miyamoto, Nobuhiko Nishiyama

Institution: Tokyo Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: New Energy and Industrial Technology Development Organization, Japan Society for the Promotion of Science, Core Research for Evolutional Science and Technology, Accelerated Innovation Research Initiative Turning Top Science and Ideas into High-Impact Values

Awards: G1689814666, Tabletop optical cloaking using metamaterial film, Exploration of breakthrough in terahertz-device performance by understanding the radiation mechanism from view point of electron travelling and transition, Broadband near-infrared/visible optical cloaking, G6349527653

OpenAlex ID: W3096054278

FWCI: 1.031

Cites: 31

Cited by: 27

Related to: 10