MOCVD growth of high purity Ga2O3 epitaxial films using trimethylgallium precursor
Year: 2020
Type: article
Source: Applied Physics Letters
DOI: 10.1063/5.0031484
Authors: George Seryogin, Fikadu Alema, Nicholas Valente, Houqiang Fu, Erich Steinbrunner, Adam T. Neal, Shin Mou, Aaron Fine, Andrei Osinsky
Language: English
Topic: Ga2O3 and related materials
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Awards: G1803745395, G6381710726, G7256377199
OpenAlex ID: W3116464833
