Work

Multi-Stacked Graphene Pellicle for Extreme Ultra Violet Lithography

Year: 2019

Type: dissertation

Source: Seoul National University Open Repository (Seoul National University)

Author: 김은정

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3155893318

Cites: 24

Cited by: 1

Related to: 10