Work

Robust nonlinear control of plasma etching.

Year: 1997

Type: article

Authors: Jeremy G. VanAntwerp, Richard D. Braatz, Nikolaos V. Sahinidis

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3169599147

FWCI: 0.502

Cites:

Cited by: 5

Related to: 10