Work

Improvement of oxide removal rate in chemical mechanical polishing by forming oxygen vacancy in ceria abrasives via ultraviolet irradiation

Year: 2021

Type: article

Source: Materials Chemistry and Physics

DOI: 10.1016/j.matchemphys.2021.124967

Authors: Eungchul Kim, Jiah Hong, Seokjun Hong, Chaitanya Kanade, Hyunho Seok, Hyeong-U Kim, Taesung Kim

Institutions: Sungkyunkwan University, Korea Institute of Machinery & Materials

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Korea Institute of Machinery and Materials, National Research Foundation of Korea, Ministry of Education, Science and Technology, National Research Council of Science and Technology

Awards: G433077807, G5264079366

OpenAlex ID: W3185377965

FWCI: 2.737

Cites: 31

Cited by: 59

Related to: 10