Work

Current Status and Future Direction of Plasma-Enhanced Atomic Layer Deposition and Etching

Year: 2019

Type: article

Source: The Japan Society of Applied Physics

Author: Nagao Kobayashi

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3187043558

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