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テトラキス(エチルメチルアミノ)ハフニウムとオゾンとからのald酸化ハフニウム薄膜

Year: 2005

Type: article

Source: Journal of The Electrochemical Society

Authors: Liu Xin-ye, Ramanathan Sasangan, Longdergan Ana, Srivastava Anuranjan, Lee Eddie, E Seidel Thomas, T Barton Jeffrey, Pang Dawen, G Gordon Roy

Language: Japanese

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3189420418

FWCI:

Cites:

Cited by: 9

Related to: 10