Work

Scalable Nanoimprint Lithography Process for Manufacturing Visible Metasurfaces Composed of High Aspect Ratio TiO 2 Meta-Atoms

Year: 2021

Type: article

Source: ACS Photonics

DOI: 10.1021/acsphotonics.1c00609

Authors: Vincent J. Einck, Mahsa Torfeh, Andrew McClung, Dae Eon Jung, Mahdad Mansouree, Amir Arbabi, James J. Watkins

Institution: University of Massachusetts Amherst

Language: English

Topic: Metamaterials and Metasurfaces Applications

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: Defense Advanced Research Projects Agency, Division of Civil, Mechanical and Manufacturing Innovation, Army Research Laboratory

Awards: G270583930, G4712870837

OpenAlex ID: W3190118328

FWCI: 5.445

Cites: 50

Cited by: 176

Related to: 10

Parts: 2