Work

Efficient Extreme Ultraviolet Mirror Design

Year: 2021
Type: book
Abstract: Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel’s equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method. Part of IOP Series in Advances in Optics, Photonics and Optoelectronics. Key features • Addresses knowledge of extreme ultra-violet (EUV) mirrors and EUV lithography. • Establishes a relation between photonic bands and Fresnel’s equation. • Introduces the high reflectivity EUV mirror design rules. • Applies numerical simulation for EUV mirror design. • Details efficient finite-difference time-domain (FDTD) approach.
Author: Yen-Min Lee
Language: English
Open Access status: bronze
OpenAlex ID: W3198039628
FWCI: 0.589
Cites: 76
Cited by: 2
Related to: 10