Work

High temperature chemical vapor deposition of aluminum nitride, growth and evaluation

Year: 2013

Type: conference-paper

Source: HAL

Authors: M. Pons, Raphaël Boichot, N. Coudurier, A. Claudel, E. Blanquet, S. Lay, F. Mercier, D. Pique

Institutions: Institut polytechnique de Grenoble, Centre National de la Recherche Scientifique, Université Joseph Fourier, Science et Ingénierie des Matériaux et Procédés, Centre National d'Études Spatiales

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3208480817

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