Work

In-Situ Ellipsometry Aided Rapid ALD Process Development and Parameter Space Visualization

Year: 2021

Type: conference-abstract

Source: ECS Meeting Abstracts

DOI: 10.1149/ma2021-0229872mtgabs

Authors: Udit Kumar, Corbin Feit, Sasha Berriel, Ayush Arunachalam, Tamil Selvan Sakthivel, Kanad Basu, Parag Banerjee, Sudipta Seal

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3211532673

Cites:

Cited by:

Related to: 10