Work

Concentration Profiles of Diffused Dopants in Silicon

Year: 1981

Type: book-chapter

Source: Materials processing, theory and practices

DOI: 10.1016/b978-0-444-86095-8.50012-4

Author: RICHARD B. FAIR

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W33139186

FWCI: 12.6

Cites: 159

Cited by: 135

Related to: 10